Question

In sputtering deposition describe the effects of using krypton, Helium, or Oxygen instead of Argon.

Answer 1

Sputtering is caused by momentum exchange between ions and atoms of the material, due to collisions.
The ions for the sputtering process are obtained from a plasma generated inside the spray equipment. Plasma is obtained when heating a gas can ionize molecules or atoms (reducing or increasing the number of electrons to form ions).
using krypton, helium or oxygen, the discharge of the electron density is higher than for a discharge of argon. Therefore the potential for pulverization is increased with krypton gases,helium y oxygen compared with argon.