Question

An article in the Journal of the Electrochemical Society describes an experiment to investigate the low-pressure...

An article in the Journal of the Electrochemical Society describes an experiment to investigate the low-pressure vapor deposition of poly-silicon. The experiment was carried out in a large-capacity reactor for Sematech in Austin, Texas. The response variable is film thickness uniformity. Three replicates of the experiment was run, and the data are as follows:

Wafer Position Uniformity
1 2.76 5.67 4.49
2 1.43 1.70 2.19
3 2.34 1.97 1.47
4 0.94 1.36 1.65
Math   Statistics-And-Probability   
0 0
Add a commentTranscribed image text
Next >

Homework Answers

Answer #1

0 0
Know the answer?
Your Answer:

Post as a guest

Your Name:

What's your source?

Earn Coins

Coins can be redeemed for fabulous gifts.

Log In

Sign Up

Not the answer you're looking for?
Ask your own homework help question
Similar Questions
Is there a difference in the wafer position? What is the p value? Use an alpha...
Is there a difference in the wafer position? What is the p value? Use an alpha = 0.05. wafer position uniformity 1 uniformity 2 uniformity 3 1 2.76 5.67 4.49 2 1.43 1.7 2.19 3 2.34 1.97 1.47 4 0.94 1.36 1.65
ADVERTISEMENT
Need Online Homework Help?

Get Answers For Free
Most questions answered within 1 hours.

Ask a Question
ADVERTISEMENT