Question

An article in the Journal of the Electrochemical Society describes an experiment to investigate the low-pressure vapor deposition of poly-silicon. The experiment was carried out in a large-capacity reactor for Sematech in Austin, Texas. The response variable is film thickness uniformity. Three replicates of the experiment was run, and the data are as follows:

Wafer Position	Uniformity
1	2.76	5.67	4.49
2	1.43	1.70	2.19
3	2.34	1.97	1.47
4	0.94	1.36	1.65

Answer 1