In semiconductor manufacturing, the root causes of defects can be attributed to
photolithography. Could you explain the reasons?
There are many kinds of defects. Some of impinge during
photolithography steps/stages.The silicon can have a flaw in the
crystal structure due to photolithography. Too heavy, too less
doped is also the reason. There may be a non-silicon impurity.
There might be a speck of dust. The mask might have a
flaw. The mask might be slightly misaligned with previous masked
layers. The oven might have been a bit too hot or too cold. The
diffusion gas might have an impurity. An airborne virus or bacteria
might have landed on the wafer.
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