Question

1. List 3 advantages and 1 disadvantage that ion implantation offers in comparison to diffusion for introducing dopant into a semiconductor wafer.?

2. In determining the optimal conditions for exposure in the photolithography process, what is the most important parameter to guarantee that the photoresist is fully exposed? Explain why this is important.?

3. In a vacuum system, the quantities pressure, flux, and mean-free path are related and each can be used to describe the overall condition of the gas in the system. Briefly explain how the three quantities are related.?

Answer 1