Question

Design an ideal abrupt silicon PN-junction at 300 K such that the donor impurity concentration Nd...

Design an ideal abrupt silicon PN-junction at 300 K such that the donor impurity concentration Nd (in
cm?3) in n-side is Nd = 5×1015/cm3 and the acceptor impurity concentration Na in the p-side is Na = 715 ×1015/cm3.
Given: the diode area A = 2×10?3 cm2, ni = 1010/cm3, ?n = 10?8 s and ?p = 10?7 s

Determine the following when a forward bias of 0.6 V is applied to the diode:
1. What are the values (in ?m) of the depletion width at the p-side of the junction xp0 and the depletion
width at the n-side xn0.

2. Minority carrier hole diffusion current Ip (Xn) at the space charge edge.

3. Minority carrier electron diffusion current In (-Xp) at the space charge edge.

4. The total diode current I.

5. Roughly, sketch the carrier distribution across the junction.

6. The reverse saturation current I0.

7. The junction capacitance Cj.

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